Negative effect of crystallization on the mechanism of laser damage in HfO2/SiO2 multilayer

Author

Tateno, R. ; Okada, H. ; Otobe, T. ; Kosuge, A. ; Koga, J.K. ; Nagashima, Kazuya ; Sugiyama, Akihiko ; Kashiwagi, Ken

Author_Institution

Shimadzu Corp., Kyoto, Japan

fYear

2011

fDate

Oct. 30 2011-Nov. 2 2011

Firstpage

1

Lastpage

2

Abstract

Elucidation for the mechanism of laser damage is indispensable to realize a high resistance mirror for the ultra-short pulse high intense lasers of the next generation. In this study, the surface and a section of a laser-damaged area of a laser mirror were observed with a laser microscope and a transmission electron microscope (cross-sectional TEM), respectively. A grain boundary of HfO₂ microcrystal was observed in the damaged area. This observation, and an evaluation of the mirror´s damage resistance showed that the formation of crystals in the multilayer mirror is one of the major determinants of damage resistance.

Keywords

crystallisation; hafnium compounds; high-speed optical techniques; laser beam effects; laser mirrors; optical multilayers; silicon compounds; transmission electron microscopy; HfO₂-SiO₂; cross-sectional TEM; crystallization; grain boundary; high intense lasers; high resistance mirror; laser damage; laser microscope; laser mirror; microcrystal; multilayer mirror; transmission electron microscope; ultra-short pulse lasers;

fLanguage

English

Publisher

ieee

Conference_Titel

Microopics Conference (MOC), 2011 17th

Conference_Location

Sendai

Print_ISBN

978-1-4577-1344-6

Type

conf

Filename

6110388