DocumentCode :
56263
Title :
Accelerated Stress Test Assessment of Through-Silicon Via Using RF Signals
Author :
Okoro, Chukwudi ; Kabos, P. ; Obrzut, Jan ; Hummler, Klaus ; Obeng, Yaw S.
Author_Institution :
Dept. of Semicond., Nat. Inst. of Stand. & Technol., Gaithersburg, MD, USA
Volume :
60
Issue :
6
fYear :
2013
fDate :
Jun-13
Firstpage :
2015
Lastpage :
2021
Abstract :
In this paper, radio frequency signal is demonstrated as an effective probe for assessing the effect of thermal cycling on the reliability of through-silicon vias (TSVs) in stacked dies. It is found that the RF signal integrity in TSV daisy chain, particularly its transmission characteristics, degrades considerably with extended thermal cycling, because of the formation and the growth of voids. Early failures are observed in the reliability analysis of the TSV daisy chain and are attributed to processing-related variability across the wafer. However, the maximum failure rate is found to occur at 500 thermal cycles, which is attributed to the initiation of defects and their subsequent propagation.
Keywords :
integrated circuit reliability; integrated circuit testing; life testing; three-dimensional integrated circuits; RF signal integrity; TSV daisy chain; TSV reliability; extended thermal cycling; radiofrequency signal; thermal cycling effect; through-silicon via accelerated stress test assessment; through-silicon via reliability; transmission characteristics; Failure analysis; radio-frequency (RF); thermal cycling; through-silicon via (TSV);
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2013.2257791
Filename :
6515167
Link To Document :
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