DocumentCode :
563284
Title :
Novel applications of intense pulsed ion beams in materials science
Author :
Yatsui, K. ; Jiang, W. ; Suematsu, H. ; Endo, F. ; Yang, S.C.
Author_Institution :
Extreme Energy Density Research Institute, Nagaoka Univeristy of Technology, Niigata 940-2188, Japan
Volume :
1
fYear :
2002
fDate :
23-28 June 2002
Firstpage :
401
Lastpage :
404
Abstract :
Using pulsed ion beam evaporation technique, experimental studies were carried out to embed metals into via holes in LSI. It will be shown that tungsten is successfully embedded in via holes with the aspect ratio of 4.3. Furthermore, light emission of blue has been observed from a poly silicon nanosize powders, which is also produced by pulsed ion beam evaporation technique.
Keywords :
Large scale integration; Magnetic resonance imaging; Plasmas; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
High-Power Particle Beams (BEAMS), 2002 14th International Conference on
Conference_Location :
Albuquerque, NM, USA
ISSN :
0094-243X
Print_ISBN :
978-0-7354-0107-5
Type :
conf
Filename :
6219473
Link To Document :
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