• DocumentCode
    563296
  • Title

    Ablation plasma generated by pulsed ion beam evaporation

  • Author

    Jiang, Weihua ; Kitayama, Shinji ; Suzuki, Tsuneo ; Suematsu, Hisayuki ; Yatsui, Kiyoshi

  • Author_Institution
    Extreme Energy-Density Research Institute, Nagaoka University of Technology, 1603-1 Kamitomioka, Niigata 940-2188, Japan
  • Volume
    1
  • fYear
    2002
  • fDate
    23-28 June 2002
  • Firstpage
    449
  • Lastpage
    452
  • Abstract
    The ablation plasma generated by pulsed ion beam evaporation has been studied. The objective of this study is to understand the property and the behavior of the ablation plasma which is being used for thin film deposition. In the experiments reported in this paper, we have concentrated on the processes of target material ablation and ablation plasma expansion. The diagnostic results are used to analyze the process of thin film deposition.
  • Keywords
    Cameras; Ion beams; Lead; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    High-Power Particle Beams (BEAMS), 2002 14th International Conference on
  • Conference_Location
    Albuquerque, NM, USA
  • ISSN
    0094-243X
  • Print_ISBN
    978-0-7354-0107-5
  • Type

    conf

  • Filename
    6219485
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=563296