DocumentCode :
563446
Title :
Operation and circuit performance of a new negative resistance most
Author :
Zuleeg, R. ; Lehovec, K.
Author_Institution :
McDonnell Douglas Astronaut. Co., Huntington Beach, CA, USA
fYear :
1974
fDate :
9-11 Dec. 1974
Firstpage :
149
Lastpage :
151
Abstract :
Operation and circuit performance of a new negative resistance insulated-gate field-effect transistor will be described. The negative resistance arises by interaction of a bipolar and an insulated-gate field-effect transistor. The gate voltage-controlled N-shaped negative resistance is similar to that of a tunnel diode, except that larger voltage and current excursions are inherent to this device. Electrical performance of integrated experimental devices and examples of circuit applications will be presented.
Keywords :
negative resistance; tunnel diodes; circuit application; circuit performance; electrical performance; gate voltage-controlled N-shaped negative resistance; negative resistance insulated gate field effect transistor; tunnel diode; Artificial intelligence; Bismuth; Circuit optimization; FETs; Logic gates; Performance evaluation; Tunneling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting (IEDM), 1974 International
Conference_Location :
Washington, DC
ISSN :
0163-1918
Type :
conf
DOI :
10.1109/IEDM.1974.6219652
Filename :
6219652
Link To Document :
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