DocumentCode
563626
Title
Photocurrent characteristics of oxygenated fullerene thin film
Author
Yang, Sung-Chae ; Mien, Tetsu
Author_Institution
Satellite Venture Business Laboratory, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8561, Japan
fYear
2000
fDate
20-25 June 2000
Firstpage
805
Lastpage
808
Abstract
In order to obtain the higher photocurrent in metal/insulator/semiconductor junction cells, oxygenated fullerene thin films are used as the insulator thin film. The highly oxygenated fullerene thin films are obtained by using RF O2 plasma with cooling system. From the experimental results, it is found that oxygenated fullerene thin films, C60 Ox (x=8, 16, 24, 38, 50 etc.), are obtained by using a laser-desorption time-of-flight mass spectrometer (TOF-MS). By using the 200 nm in thick multilayer fullerene junction film, the photocurrent becomes 30 times larger that of normal fullerene.
Keywords
Electrodes; Lighting; Measurement by laser beam; Optical films; Optical polymers; Photoconductivity; RF plasma; multiplayer film; oxygenated fullerene; photocurrent; photoelectric device;
fLanguage
English
Publisher
ieee
Conference_Titel
High-Power Particle Beams, 2000 13th International Conference on
Conference_Location
Nagaoka, Japan
Type
conf
Filename
6219990
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