Title :
Development of large size ion source for ion Shower Doping
Author :
Sodekoda, T. ; Kuwabara, H. ; Nakamoto, I. ; Kawasaki, Y. ; Nakashizu, T.
Author_Institution :
Mechatronics Development Center, Ishikawajima-Harima Heavy Industries Co., Ltd., 3-1-15 Toyosu, Koto-ku, Tokyo 135-8732, Japan
Abstract :
We developed the new Ion Shower Doping system “ISDR series” for formation of TFTS. This system is available for large glass substrate of 680 × 880 mm maximumly. We simplify the glass transform system, so glass move only horizontally. Beam uniformity achieve 2 to 3% (3σ). We introduce here the property of new ISDR series comparing with conventional ISD series.
Keywords :
Glass; LCD; TFT; doping; ion; poly-Si;
Conference_Titel :
High-Power Particle Beams, 2000 13th International Conference on
Conference_Location :
Nagaoka, Japan
