• DocumentCode
    563952
  • Title

    Thin-film deposition process by pulsed ion-beam generated ablation plasma

  • Author

    Jiang, W. ; Kawahara, H. ; Shishido, H. ; Suematsu, H. ; Yunogami, T. ; Yatsui, K.

  • Author_Institution
    Extreme Energy-Density Res. Inst., Nagaoka Univ. of Technol., Nagaoka, Japan
  • fYear
    2004
  • fDate
    18-23 July 2004
  • Firstpage
    659
  • Lastpage
    662
  • Abstract
    Pulsed ion-beam evaporation (IBE) is a practical technique of thin film deposition. In this paper, the process of IBE is studied with concentration on the importance of physical properties of the target material. The experiments were carried out by using different kinds of metal targets. The results have helped us in understanding the physical relation between the ablation plasma behavior and the thin-film surface morphology.
  • Keywords
    ion beam assisted deposition; thin films; vacuum deposition; pulsed ion-beam evaporation; pulsed ion-beam generated ablation plasma; thin-film deposition; thin-film surface morphology; Films; Ion beams; Lead; Plasma temperature; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    High-Power Particle Beams (BEAMS 2004), 2004 International Conference on
  • Conference_Location
    St. Petersburg
  • Print_ISBN
    978-5-87911-088-3
  • Type

    conf

  • Filename
    6220631
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=563952