Title :
Improved tangent space based distance metric for accurate lithographic hotspot classification
Author :
Jing Guo ; Fan Yang ; Sinha, S. ; Chiang, Charles ; Xuan Zeng
Author_Institution :
Microelectron. Dept., Fudan Univ., Shanghai, China
Abstract :
A distance metric of patterns is crucial to hotspot cluster analysis and classification. In this paper, we propose an improved tangent space based metric for pattern matching based hotspot cluster analysis and classification. The proposed distance metric is an important extension of the well-developed tangent space method in computer vision. It can handle patterns containing multiple polygons, while the traditional tangent space method can only deal with patterns with a single polygon. It inherits most of the advantages of the traditional tangent space method, e.g., it is easy to compute and is tolerant with small variations or shifts of the shapes. Compared with the existing distance metric based on XOR of hotspot patterns, the improved tangent space based distance metric can achieve up to 37.5% accuracy improvement with at most 4.3× computational cost in the context of cluster analysis. The improved tangent space based distance metric is a more reliable and accurate metric for hotspot cluster analysis and classification. It is more suitable for industry applications.
Keywords :
computer vision; electronic design automation; lithography; pattern classification; pattern clustering; pattern matching; accurate lithographic hotspot classification; computer vision; hotspot cluster analysis; multiple polygons; pattern matching; tangent space based distance metric; Accuracy; Extraterrestrial measurements; Noise; Pattern matching; Shape; Turning; Classification; Distance Metric; Hotspot; Lithographic;
Conference_Titel :
Design Automation Conference (DAC), 2012 49th ACM/EDAC/IEEE
Conference_Location :
San Francisco, CA
Print_ISBN :
978-1-4503-1199-1