DocumentCode :
568015
Title :
Photovoltaic thin-film materials characterized using spectroscopic ellipsometry
Author :
Fujiwara, Hiroyuki ; Kageyama, Shota ; Yuguchi, Tetsuya ; Kanie, Yosuke
Author_Institution :
Center of Innovative Photovoltaic Syst. (CIPS), Gifu Univ., Grfu, Japan
fYear :
2012
fDate :
4-6 July 2012
Firstpage :
281
Lastpage :
284
Abstract :
To establish new characterization methods for Si-based-thin-film solar cells, we have developed spectroscopic ellipsometry (SE) techniques that can be applied for the analysis of light absorber layers in the solar cells. In particular, our SE analyses allow the detailed characterization of (i) hydrogenated amorphous silicon (a-Si:H) and (ii) microcrystalline silicon ((μc-Si:H) thin films fabricated on large-area glass substrates. For the determination of a-Si:H properties, an optical database, in which the optical constants of a-Si:H are described completely by SiH and SiH2 hydrogen contents, has been constructed. By applying this model, SiH2 contents in a-Si:H layers prepared on glass substrates can be estimated rather easily. Moreover, the μc-Si:H dielectric functions have been parameterized completely by our dielectric function model and this parameterization scheme has been applied successfully to describe the structural variation of a-Si:H/μc-Si:H mixed phase materials. From the above analysis technique, we demonstrate the high-precision analyses of light absorber layers used in the Si thin-film solar cells.
Keywords :
amorphous semiconductors; dielectric function; elemental semiconductors; ellipsometry; hydrogen; optical constants; plasma CVD; semiconductor growth; semiconductor thin films; silicon; solar cells; Si-based-thin-film solar cells; Si:H; dielectric functions; high-precision analyses; hydrogenated amorphous silicon thin films; large-area glass substrates; light absorber layers; microcrystalline silicon thin films; mixed phase materials; optical constants; optical database; parameterization scheme; photovoltaic thin-film materials; spectroscopic ellipsometry; Dielectrics; Ellipsometry; Glass; Optical device fabrication; Rough surfaces; Substrates; Surface roughness;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Active-Matrix Flatpanel Displays and Devices (AM-FPD), 2012 19th International Workshop on
Conference_Location :
Kyoto
Print_ISBN :
978-1-4673-0399-6
Type :
conf
Filename :
6294905
Link To Document :
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