Title :
Double crystalline silicon channel thin film transistor by continuous-wave green laser for large-sized OLED display
Author :
Hayashi, Hiroshi ; Kanegae, Arinobu ; Nishida, Kenichirou ; Kawashima, Takahiro ; Saitoh, Tohru ; Komori, Kazunori
Author_Institution :
Image Devices Dev. Center, Panasonic Corp., Kyoto, Japan
Abstract :
We developed double crystalline silicon channel thin film transistor by continuous-wave green laser. The electrical characteristics shows high mobility, high reliability, and kink-free output characteristics. The excellent characteristics and sufficient channel etching margin can provide a solution for large-sized organic light emitting diode display, including 8th generation technology.
Keywords :
LED displays; elemental semiconductors; organic light emitting diodes; semiconductor thin films; silicon; thin film transistors; Si; channel etching margin; continuous-wave green laser; double crystalline silicon channel thin film transistor; electrical characteristics; kink-free output characteristics; large-sized organic light emitting diode display; Amorphous silicon; Etching; Films; Organic light emitting diodes; Substrates; Thin film transistors;
Conference_Titel :
Active-Matrix Flatpanel Displays and Devices (AM-FPD), 2012 19th International Workshop on
Conference_Location :
Kyoto
Print_ISBN :
978-1-4673-0399-6
