DocumentCode
571137
Title
Analysis of thermally-annealed InGaN quantum wells for light-emitting diodes
Author
Jiao, Xuechen ; Zhao, Peng ; Zhao, Hongping
Author_Institution
Dept. of Electr. Eng. & Comput. Sci., Case Western Reserve Univ., Cleveland, OH, USA
fYear
2012
fDate
29-31 May 2012
Firstpage
1
Lastpage
5
Abstract
Thermally-annealed InGaN quantum wells (QWs) with various interdiffusion lengths (Ld) are numerically analyzed as improved active region for Light-Emitting Diodes (LEDs). The calculations of the band structure, wavefunction for electrons and holes are based on a self-consistent 6-band k·p method taking into account the valence band mixing, strain effect, spontaneous and piezoelectric polarizations and carrier screening effect. The spontaneous emission radiative recombination rate (Rsp) was calculated for thermally-annealed 3-nm In0.25Ga0.75N QWs with various interdiffusion lengths (Ld), as compared to that of the conventional InGaN QWs emitting at the similar wavelength. Studies show that the electron-hole wavefunction overlap is significantly enhanced for the thermally-annealed InGaN QWs, which results in the improved spontaneous emission radiative recombination rate for enhancing LED output power.
Keywords
III-V semiconductors; annealing; band structure; chemical interdiffusion; indium compounds; k.p calculations; light emitting diodes; piezoelectricity; semiconductor quantum wells; spontaneous emission; valence bands; InGaN; LED output power; band structure; carrier screening effect; electron wavefunction; electron-hole wavefunction; hole wavefunction; interdiffusion length; light emitting diode; piezoelectric polarization; self-consistent 6-band k·p method; spontaneous emission radiative recombination rate; spontaneous polarization; strain effect; thermally-annealed quantum well; valence band mixing; wavelength 3 nm; Educational institutions; Gallium nitride; Indexes; Materials; Radiative recombination; Semiconductor diodes; Semiconductor lasers; InGaN QWs; Light-Emitting Diode; interdiffusion; rapid thermal annealing;
fLanguage
English
Publisher
ieee
Conference_Titel
Energytech, 2012 IEEE
Conference_Location
Cleveland, OH
Print_ISBN
978-1-4673-1836-5
Electronic_ISBN
978-1-4673-1834-1
Type
conf
DOI
10.1109/EnergyTech.2012.6304639
Filename
6304639
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