DocumentCode :
57170
Title :
High Performance of Midwave Infrared HgCdTe e-Avalanche Photodiode Detector
Author :
Singh, Anand ; Shukla, A.K. ; Pal, Ravinder
Author_Institution :
Solid State Phys. Lab., Delhi, India
Volume :
36
Issue :
4
fYear :
2015
fDate :
Apr-15
Firstpage :
360
Lastpage :
362
Abstract :
This letter reports on the design and fabrication of HgCdTe electron-avalanche photodiode (e-APD) for low dark current and high gain for imaging applications. HgCdTe e-APD photodiodes were fabricated in the n+-ν-p+ configuration for FPA at 30 μm × 30 μm pitch. Process for creating the required carrier profile and compositional grading in the absorption and multiplication regions was developed. Graded bandgap profile in the absorption region has been introduced. Shallow mesa etch isolation and effective passivation of side walls were introduced to control lateral currents. High quantum efficiency of 65% makes these APDs suitable for applications like quantum encryption. These measures helped in achieving high avalanche gain of 5550 at 8 V reverse bias in HgCdTe MWIR e-APD for the first time.
Keywords :
II-VI semiconductors; avalanche photodiodes; electron absorption; etching; focal planes; infrared detectors; mercury compounds; passivation; photodetectors; FPA; HgCdTe; MWIR e-APD; absorption region; compositional grading; dark current; efficiency 65 percent; graded bandgap profile; imaging application; midwave infrared electron-avalanche photodiode detector; multiplication region; n±-ν-p± configuration; quantum encryption; shallow mesa etch isolation; side wall passivation; voltage 8 V; Absorption; Avalanche photodiodes; Current measurement; Dark current; Detectors; Fabrication; Differential Hall; HgCdTe e-APD; Infrared Detector; Infrared detector; Thermal imaging; differential Hall; thermal imaging;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2015.2400571
Filename :
7035037
Link To Document :
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