• DocumentCode
    57429
  • Title

    Comparison of ZnO-Based JFET, MESFET, and MISFET

  • Author

    Klupfel, F.J. ; Schein, F.-L. ; Lorenz, M. ; Frenzel, H. ; von Wenckstern, Holger ; Grundmann, Marius

  • Author_Institution
    Fak. fur Phys. und Geowissenschaften, Univ. Leipzig, Leipzig, Germany
  • Volume
    60
  • Issue
    6
  • fYear
    2013
  • fDate
    Jun-13
  • Firstpage
    1828
  • Lastpage
    1833
  • Abstract
    We compare key properties of zinc oxide (ZnO)-based junction field-effect transistors (JFETs), metal-semiconductor field-effect transistors (MESFETs), and metal-insulator-semiconductor field-effect transistors (MISFETs) prepared from a common ZnO:Mg thin film. The JFETs are fabricated with a ZnCo2O4-gate, the MESFETs with reactively sputtered Pt-gate and the MISFETs with WO3 as gate insulator. The three FET types are compared with regarding dc characteristics, frequency dependence, and stability at temperatures up to 150°C. All devices can be switched within a similar gate voltage range of less than 3 V, making a direct comparison of the device characteristics possible. Measurements above room temperature show a common shift of the transfer curves to higher gate voltages, which seems to be a distinguishing property of ZnO compared with other semiconductors. All electric measurements show major differences between the devices, which can be attributed to the different gate structures.
  • Keywords
    II-VI semiconductors; MISFET; Schottky gate field effect transistors; cobalt compounds; junction gate field effect transistors; magnesium; platinum; tungsten compounds; wide band gap semiconductors; zinc compounds; JFET; MESFET; MISFET; Pt; WO3; ZnCo2O4; ZnO:Mg; dc characteristics; frequency dependence; gate insulator; gate structures; metal-insulator-semiconductor field-effect transistors; metal-semiconductor field-effect transistors; reactively sputtered platinum-gate; temperature stability; transfer curves; zinc oxide based junction field-effect transistors; Junction field-effect transistors (JFETs); metal-insulator-semiconductor field-effect transistors (MISFETs); metal-semiconductor field-effect transistors (MESFETs); zinc oxide (ZnO);
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2013.2257173
  • Filename
    6515349