Title :
Temperature and geometry dependence of the electrothermal instability of bipolar transistors
Author :
Scholten, A.J. ; Vanhoucke, T. ; Klaassen, D.B.M.
Author_Institution :
NXP Res., Eindhoven, Netherlands
fDate :
Sept. 30 2012-Oct. 3 2012
Abstract :
We present an extensive investigation into the temperature and geometry dependence of the electrothermal instability of bipolar transistors. It is shown that the stable operating region increases with decreasing transistor size, which is explained by the geometry dependence of the thermal and base resistances. Next, data taken over a large range of temperatures (-40 to 150 oC) are analyzed. It is shown that, for the technology at hand, an additional margin of ~1V above BVCEO is present for the full temperature range. Moreover, it is shown that the temperature-dependent data can be reduced to a single `master curve´ by plotting the instability point versus the collector current at VCB =0 V. This leads to a simple rule-of-thumb that can be used by circuit designers to estimate the limit of stable operation at all temperatures.
Keywords :
bipolar transistors; geometry; BVCEO; base resistance; bipolar transistor; circuit design; current collector; electrothermal instability; geometry dependence; single master curve; temperature -40 degC to 150 degC; temperature-dependent data; thermal resistance; Bipolar transistors; Current measurement; Geometry; Temperature dependence; Temperature distribution; Temperature measurement; Thermal resistance; Avalanche breakdown; Bipolar Transistors; Electrothermal effects; Stability Criteria;
Conference_Titel :
Bipolar/BiCMOS Circuits and Technology Meeting (BCTM), 2012 IEEE
Conference_Location :
Portland, OR
Print_ISBN :
978-1-4673-3020-6
DOI :
10.1109/BCTM.2012.6352624