DocumentCode
578019
Title
Diffraction phase microscopy for wafer inspection
Author
Zhou, Renjie ; Edwards, Chris ; Popescu, Gabriel ; Goddard, Lynford L.
Author_Institution
Dept. of Electr. & Comput. Eng., Univ. of Illinois at Urbana-Champaign, Urbana, IL, USA
fYear
2012
fDate
23-27 Sept. 2012
Firstpage
644
Lastpage
645
Abstract
We built a compact, common path, laser epi-illumination diffraction phase microscope (epi-DPM) for defect detection on a patterned semiconductor wafer. The wafer´s underlying structure and buried defects with ~ 100 nm size were measured.
Keywords
inspection; light diffraction; measurement by laser beam; optical microscopy; buried defects; compact common path laser epiillumination diffraction phase microscopy; defect detection; diffraction phase microscopy; epiDPM; patterned semiconductor wafer; wafer inspection; Correlation; Diffraction; Inspection; Laser beams; Scanning electron microscopy; Semiconductor device measurement; diffraction; microscope; phase microscope; wafer inspection;
fLanguage
English
Publisher
ieee
Conference_Titel
Photonics Conference (IPC), 2012 IEEE
Conference_Location
Burlingame, CA
Print_ISBN
978-1-4577-0731-5
Type
conf
DOI
10.1109/IPCon.2012.6358786
Filename
6358786
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