DocumentCode :
578483
Title :
Development of CMOS integrated AlN based SAW-Filter and the role of Si substrate resistivity
Author :
Kaletta, U. ; Wolansky, D. ; Fraschke, M. ; Wenger, Ch
Author_Institution :
IHP, Frankfurt (Oder), Germany
fYear :
2012
fDate :
24-26 Sept. 2012
Firstpage :
79
Lastpage :
82
Abstract :
Integrated AlN/SiO2/Si(100) delay lines for Rayleigh surface acoustic waves (SAWs) with resonant frequencies up to 3.4 GHz were fabricated using a new CMOS compatible concept. Atomic force microscopy (AFM) and transmission electron microscopy (TEM) images were done to characterize the piezoelectric AlN layer. The roughness of the AlN surface is less than 3 nm. Due to the extremely flat AlN surface, it is possible to produce frequency filters with low losses due to the surface roughness. Furthermore, S-parameter measurements of SAW filters with different substrate resistivities were performed. Large substrate resistivities of 4000 Ωcm lead to a high out-of-band insertion loss due to the reduced capacitive coupling to the Silicon substrate, which is an important parameter for SAW applications. An additional SiO2 layer can further increase the out-of-band insertion loss.
Keywords :
CMOS integrated circuits; Rayleigh waves; S-parameters; aluminium compounds; atomic force microscopy; delay lines; piezoelectric devices; silicon; surface acoustic wave filters; surface roughness; transmission electron microscopy; AFM images; AlN-SiO2-Si; CMOS compatible concept; CMOS integrated aluminum nitride based SAW-filter; Rayleigh SAW; Rayleigh surface acoustic waves; S-parameter measurements; atomic force microscopy; frequency filters; integrated delay lines; out-of-band insertion loss; piezoelectric layer; reduced capacitive coupling; resonant frequency; silicon substrate resistivity; surface roughness; transmission electron microscopy images; Conductivity; Europe; Lead; Materials; Microscopy; Surface acoustic waves; AFM; AlN; CMOS; Rayleigh; SAW; TEM; resistivity;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Conference Dresden-Grenoble (ISCDG), 2012 International
Conference_Location :
Grenoble
Print_ISBN :
978-1-4673-1717-7
Type :
conf
DOI :
10.1109/ISCDG.2012.6359984
Filename :
6359984
Link To Document :
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