Morphologies of Ag dots printed by electrohydrodynamic (EHD) jet printing on a silicon wafer

Recently electrohydrodynamics (EHD) jet printing technology has been one of the main alternatives for micro-scale or nano-scale fabrication and manufacturing of electronic devices. This technology allows us relatively low-cost, simple manufacturing of the thin film transistor or organic devices. The main advantage of EHD jet printing compared with the other conventional inkjet printing technologies is the capability to realize printing below 20 μm of patterning and eject high viscosity ink. In this study, by using drop on demand (DOD) operation of jetting we demonstrated silver (Ag) dots printed on silicon (Si) wafer and investigate the effects of the substrate surface energe and temperature on the dot morphologies. We also investigated the effect of overprinting process on the pattern height and diameter. Our studies showed that we successfully realized below 20 μm of dots pattern by using EHD jet printing. Furthermore, overprinting process and temperature condition during printing process showed effects on dots morphologies.