Determination of energy deposition as a function of high atomic number material depth using the 225 W Pulserad

For fluence greater than 105 ca1/cm2, a multi-layered or filtered Faraday cup for time-integrated charge deposition profile measurements has been utilized on 225 W Pulserad. The effect of reflected electrons on diode behavior has been examined and found to be non-negligible for certain target configurations. Graphite, copper and tantalum targets have been used. By adjusting the mean angle of incidence and albedo in a Monte Carlo computer code, we calculate transmission curves which suit the best possible experimental results. Then, these parameters are used in energy deposition determinations.