• DocumentCode
    585028
  • Title

    Focusing of intense ion beam by the “Inverse Pinch Ion Diode”

  • Author

    Hashimoto, Y. ; Sato, M. ; Yatsuzuka, M. ; Nobuhara, S.

  • Author_Institution
    Dept. of Electr. Eng., Himeji Inst. of Technol., Himeji, Japan
  • fYear
    1990
  • fDate
    2-5 July 1990
  • Firstpage
    475
  • Lastpage
    480
  • Abstract
    Focusing of intense ion beams has been attained with the “Inverse Pinch Ion Diode” which has a flat anode. The energy of the ion beam was 180 keV. At the focal point, the ion current density of 0.5 kA/cm2 has been obtained and the focusing radius of the ion beam (FWHM) is 10 mm. Focusing of the ion beam is due to the electrostatic field in the “Inverse Pinch Ion Diode”.
  • Keywords
    anodes; current density; electric fields; plasma confinement; plasma diodes; plasma focus; FWHM; electron volt energy 180 keV; electrostatic field; flat anode; focusing radius; intense ion beam focusing; inverse pinch ion diode; ion current density; size 10 mm; Anodes; Cathodes; Current density; Focusing; Ion beams; Voltage measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    High-Power Particle Beams, 1990 8th International Conference on
  • Conference_Location
    Novosibirsk
  • Print_ISBN
    9.7898102055e+012
  • Type

    conf

  • Filename
    6396311
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=585028