Title :
300-keV High-power ion-beam source: Practical applications
Author :
Goncharov, O.I. ; Isakov, Ivan F. ; Kolodii, V.N. ; Matvienko, V.M. ; Opekunov, M.S. ; Remnev, G.E. ; Usov, Yu P. ; Zakutayev, A.N.
Author_Institution :
Nucl. Phys. Inst., Tomsk, Russia
Abstract :
A 300-keV high-power ion-beam source has been evaluated. The results obtained are reported. An extra high-voltage pulse was applied to the anode to produce plasma of a certain species content. In particular, accelerator beam was used to prepare 0.01-1 m-thick metallic films.
Keywords :
ion beam assisted deposition; ion beams; ion sources; plasma production; electron volt energy 300 keV; extra high voltage pulse; high power ion beam source; metallic film; plasma production; size 0.01 m to 1 m; Films; Ion beams; Plasmas; Rough surfaces; Semiconductor diodes;
Conference_Titel :
High-Power Particle Beams, 1990 8th International Conference on
Conference_Location :
Novosibirsk
Print_ISBN :
9.7898102055e+012
