Title :
Quick deposition of various thin films by intense pulsed ion beam
Author :
Masugata, K. ; Sonegawa, T. ; Ohashi, M. ; Hoshino, H. ; Shimotori, Y. ; Furuuchi, S. ; Yamamoto, H. ; Ono, T. ; Mito, M. ; Sato, H. ; Hatsushika, T. ; Suzuki, T. ; Takaai, T. ; Yatsui, K.
Author_Institution :
Lab. Beam Tech., Nagaoka Univ. Tech., Nagaoka, Japan
Abstract :
A high-density, high-temperature, ablation plasma has been efficiently produced by the irradiation of an intense pulsed ion beam onto solid targets. Properties of such the target plasma has been diagnosed by using time-resolved spectroscopy and high speed photography. Electron temperature and density of the plasma was estimated to be ~ 0.8 eV and ~ 1018 cm-3, respectively. By using such the ablation plasma, we have succeeded to prepare very quickly various kinds of thin films such as electroluminescent layer of ZnS, superconductive film of Y1Ba2Cu3O7-x, and high dielectric constant material of BaTiO3.
Keywords :
barium compounds; dielectric thin films; ion beams; photography; plasma density; plasma deposition; plasma diagnostics; plasma temperature; superconducting thin films; time resolved spectroscopy; yttrium compounds; zinc compounds; BaTiO3; YBa2Cu3O7-x; ZnS; dielectric constant material; electroluminescent layer; electron temperature; high speed photography; high-density high-temperature ablation plasma; intense pulsed ion beam irradiation; plasma density estimation; plasma diagnostics; superconductive film; thin film deposition; time-resolved spectroscopy; Anodes; Films; Particle beams; Plasma measurements; Plasma temperature; Substrates;
Conference_Titel :
High-Power Particle Beams, 1990 8th International Conference on
Conference_Location :
Novosibirsk
Print_ISBN :
9.7898102055e+012
