DocumentCode :
586863
Title :
Systematic defect screening in controlled experiments using volume diagnosis
Author :
Seshadri, B. ; Gupta, Puneet ; Lin, Y.T. ; Cory, B.
Author_Institution :
Nvidia, Santa Clara, CA, USA
fYear :
2012
fDate :
5-8 Nov. 2012
Firstpage :
1
Lastpage :
7
Abstract :
Controlled modification of different process parameters, using designed experiments, is a key method of achieving high yield in a volume manufacturing environment. However, these changes need to be validated extensively and screened for new systematic defects before release to production. This work presents a novel approach of using volume diagnosis to aid in the screening process. Silicon case studies are presented to validate the production worthiness of this approach.
Keywords :
industrial control; manufacturing processes; silicon; controlled experiments; controlled modification; process parameters; production worthiness; silicon case studies; systematic defect screening process; volume diagnosis; volume manufacturing environment; Logic gates; Manufacturing; Metals; Production; Standards; Systematics; Upper bound;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Test Conference (ITC), 2012 IEEE International
Conference_Location :
Anaheim, CA
ISSN :
1089-3539
Print_ISBN :
978-1-4673-1594-4
Type :
conf
DOI :
10.1109/TEST.2012.6401546
Filename :
6401546
Link To Document :
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