Title :
Monte Carlo simulation of InGaAs/strained-InAs/InGaAs channel HEMTs considering self-consistent analysis of 2-dimensional electron gas
Author :
Endoh, Akira ; Watanabe, Issei ; Mimura, Takashi
Author_Institution :
Nat. Inst. of Inf. & Commun. Technol. (NICT), Koganei, Japan
Abstract :
We calculated the unstrained and the strained band structures of InAs and carried out Monte Carlo simulation of InGaAs/strained-InAs/InGaAs composite channel high electron mobility transistors (HEMTs) considering 2-dimensional electron gas (2DEG) self-consistent analysis by solving Schrödinger and Poisson equations. With considering the effect of 2DEG, the drain-source current Ids decreases. However, the negative threshold voltage shift due to the short-channel effects is not affected by considering 2DEG. The threshold voltage shift occurs in the region Lg/d <; ~5 (Lg: gate length, d: sum of the barrier and channel layer thicknesses). At Lg = 20 nm, the simulated cutoff frequency fT values were 943 GHz without 2DEG and 813 GHz with 2DEG. The trend of the fT values with Lg reflects that of the electron velocities mainly.
Keywords :
III-V semiconductors; Monte Carlo methods; Poisson equation; SCF calculations; Schrodinger equation; band structure; gallium arsenide; high electron mobility transistors; indium compounds; two-dimensional electron gas; 2-dimensional electron gas; 2DEG; InAs-InGaAs; InGaAs-strained-InAs-InGaAs channel HEMT; Monte Carlo simulation; Poisson equation; Schrodinger equation; band structures; drain-source current; electron velocity; frequency 813 GHz; frequency 943 GHz; high electron mobility transistors; negative threshold voltage shift; self-consistent analysis; short-channel effects; simulated cut-off frequency; Cutoff frequency; HEMTs; Indium gallium arsenide; Logic gates; MODFETs; Monte Carlo methods; Threshold voltage; ƒT; 2-dimensional electron gas; Band structure; HEMTs; Monte Carlo simulation; cutoff frequency; strained InAs; threshold voltage shift;
Conference_Titel :
Indium Phosphide and Related Materials (IPRM), 2012 International Conference on
Conference_Location :
Santa Barbara, CA
Print_ISBN :
978-1-4673-1725-2
DOI :
10.1109/ICIPRM.2012.6403315