• DocumentCode
    587838
  • Title

    InP HBT with 55-nm-wide emitter and relationship between emitter width and current density

  • Author

    Tanaka, Kiyoshi ; Miyamoto, Yutaka

  • Author_Institution
    Dept. of Phys. Electron., Tokyo Inst. of Technol., Tokyo, Japan
  • fYear
    2012
  • fDate
    27-30 Aug. 2012
  • Firstpage
    188
  • Lastpage
    191
  • Abstract
    We fabricated an InP heterojunction bipolar transistor (HBT) with a 55-nm-wide emitter. For an emitter width of 55 nm and that greater than 300 nm, the maximum gain was around 15 and around 120, respectively. To confirm the relationship between the acceptable current density and the emitter width, we measured the current density when the current gain was half its maximum value. The measured current density Jhalf increased with a decrease in the emitter width. The highest observed current density was approximately 5 MA/cm2 and was nearly equal to the highest reported current density of InP HBTs.
  • Keywords
    III-V semiconductors; current density; heterojunction bipolar transistors; indium compounds; semiconductor device measurement; HBT; InP; current density; current gain; emitter width; heterojunction bipolar transistor; maximum gain; size 55 nm; Current density; Heterojunction bipolar transistors; Indium phosphide; Lithography; Scanning electron microscopy; Time measurement; InP; electron beam lithography; heterojunction bipolar transistor; self-heating effect;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials (IPRM), 2012 International Conference on
  • Conference_Location
    Santa Barbara, CA
  • ISSN
    1092-8669
  • Print_ISBN
    978-1-4673-1725-2
  • Type

    conf

  • DOI
    10.1109/ICIPRM.2012.6403354
  • Filename
    6403354