DocumentCode :
588002
Title :
Light ion beam production by an applied Br magnetically insulated annular diode
Author :
Mizui, J. ; Masugata, K. ; Nakagawa, Yukihiro ; Yatsui, K. ; Sato, Mitsuhisa ; Yonezu, H. ; Tazima
Author_Institution :
Institute of Plasma Physics, Nagoya University, 464, Japan
fYear :
1983
fDate :
12-14 Sept. 1983
Firstpage :
151
Lastpage :
154
Abstract :
We tested a Br magnetically insulated annular diode for 50 nsec-pulse ion beam production. The ratio of ion to electron current was measured to be about 40 %, which agreed with the ratio of an electron to ion residence time in the diode gap. There was found apparent correlation between patterns of cathode electron bombardment on the anode and of ion beams through the cathode, which implied that the cathode electron bombardment played an important role in production of the anode plasma. It was also demonstrated that a specially treated plastic plane anode worked as well as the usual anode with buried copper pins. The treatment is to expose previously the anode surface to intense electron bombardment under no magnetic insulation before ion beam production.
fLanguage :
English
Publisher :
ieee
Conference_Titel :
High-Power Particle Beams, 1983. HPPB. 5th International Conference on
Conference_Location :
San Francisco, CA, USA
Type :
conf
Filename :
6403772
Link To Document :
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