DocumentCode
588002
Title
Light ion beam production by an applied Br magnetically insulated annular diode
Author
Mizui, J. ; Masugata, K. ; Nakagawa, Yukihiro ; Yatsui, K. ; Sato, Mitsuhisa ; Yonezu, H. ; Tazima
Author_Institution
Institute of Plasma Physics, Nagoya University, 464, Japan
fYear
1983
fDate
12-14 Sept. 1983
Firstpage
151
Lastpage
154
Abstract
We tested a Br magnetically insulated annular diode for 50 nsec-pulse ion beam production. The ratio of ion to electron current was measured to be about 40 %, which agreed with the ratio of an electron to ion residence time in the diode gap. There was found apparent correlation between patterns of cathode electron bombardment on the anode and of ion beams through the cathode, which implied that the cathode electron bombardment played an important role in production of the anode plasma. It was also demonstrated that a specially treated plastic plane anode worked as well as the usual anode with buried copper pins. The treatment is to expose previously the anode surface to intense electron bombardment under no magnetic insulation before ion beam production.
fLanguage
English
Publisher
ieee
Conference_Titel
High-Power Particle Beams, 1983. HPPB. 5th International Conference on
Conference_Location
San Francisco, CA, USA
Type
conf
Filename
6403772
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