DocumentCode :
588158
Title :
Origin of wide retention distribution in 1T Floating Body RAM
Author :
Aoulaiche, Marc ; Nicoletti, T. ; Veloso, A. ; Roussel, P.J. ; Simoen, Eddy ; Claeys, Cor ; Groeseneken, Guido ; Jurczak, Malgorzata
Author_Institution :
Imec, Leuven, Belgium
fYear :
2012
fDate :
1-4 Oct. 2012
Firstpage :
1
Lastpage :
2
Abstract :
The variability of 1T FBRAM performances is investigated. The VG read window and the state "1" distribution are correlated with the number of holes injected during the write "1" related to the electric field in the S/D junctions. Besides, the origin of wide retention time distribution has been correlated with the distribution of G-R center in the Si band gap. Single defect with the Si midgap energy level can generate a leakage path affecting strongly the cell retention time. This can explain also wide retention distribution. Thight control of such defects poses extreme challange for the manufacturing of FBRAM.
Keywords :
random-access storage; 1T FBRAM; 1T floating body RAM; DRAM; FBRAM manufacturing; G-R center distribution; S/D junctions; VG read window; cell retention time; electric field; leakage path; one transistor floating body RAM; size 20 nm; wide retention time distribution; Correlation; Energy states; Junctions; Logic gates; Photonic band gap; Random access memory; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
SOI Conference (SOI), 2012 IEEE International
Conference_Location :
NAPA, CA
ISSN :
1078-621X
Print_ISBN :
978-1-4673-2690-2
Electronic_ISBN :
1078-621X
Type :
conf
DOI :
10.1109/SOI.2012.6404394
Filename :
6404394
Link To Document :
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