DocumentCode :
593767
Title :
Transparent film thickness measurement by three-wavelength interference method: An extended application of Global Model Fitting algorithm
Author :
Kitagawa, Koichiro
Author_Institution :
R&D Div., Toray Eng. Co. Ltd., Otsu, Japan
fYear :
2012
fDate :
21-23 Nov. 2012
Firstpage :
94
Lastpage :
100
Abstract :
Conventional transparent film thickness measurement methods such as spectroscopy are basically capable of measuring a single point at a time, and the spatial resolution is limited. We propose a novel areal film thickness measurement method by extending the Global Model Fitting algorithm developed for three-wavelength interferometric surface profiling. It estimates the film thickness distribution from a color image captured by a color camera with three-wavelength illumination. The validity of the proposed method is demonstrated by computer simulations and actual experiments.
Keywords :
cameras; thickness measurement; thin films; color camera; color image; computer simulations; film thickness distribution; film thickness measurement method; global model fitting algorithm; spatial resolution; three-wavelength illumination; three-wavelength interference method; three-wavelength interferometric surface profiling; transparent film thickness measurement method; Cameras; Films; Fitting; Image color analysis; Interference; Semiconductor device measurement; Thickness measurement; interference color; model fitting; thickness measurement; three-wavelength; transparent film;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Mechatronics (MECATRONICS) , 2012 9th France-Japan & 7th Europe-Asia Congress on and Research and Education in Mechatronics (REM), 2012 13th Int'l Workshop on
Conference_Location :
Paris
Print_ISBN :
978-1-4673-4770-9
Electronic_ISBN :
978-1-4673-4771-6
Type :
conf
DOI :
10.1109/MECATRONICS.2012.6450993
Filename :
6450993
Link To Document :
بازگشت