• DocumentCode
    597271
  • Title

    Inelastic-elastic properties of SiO2, SiO2 + TiO2 + ZrO2

  • Author

    Onanko, A.P. ; Kulish, M.P. ; Lyashenko, O.V. ; Prodayvoda, G.T. ; Vyzhva, S.A. ; Onanko, Y.A.

  • Author_Institution
    Taras Shevchenko Kyiv national university, Ukraine
  • fYear
    2012
  • fDate
    3-7 Sept. 2012
  • Firstpage
    81
  • Lastpage
    82
  • Abstract
    A non-destructive method for the technological control of the structure defects in SiO2 + Si wafers by measuring the internal friction background difference on the nearby harmonics f1 and f2 after mechanical and heat treatments.
  • Keywords
    Crystals; Films; Friction; Microstructure; Silicon; Temperature measurement; Vibrations; dislocations; elastic module; internal friction; microstructure; structure defects;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Oxide Materials for Electronic Engineering (OMEE), 2012 IEEE International Conference on
  • Conference_Location
    Lviv, Ukraine
  • Print_ISBN
    978-1-4673-4491-3
  • Type

    conf

  • DOI
    10.1109/OMEE.2012.6464790
  • Filename
    6464790
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=597271