Title :
Inelastic-elastic properties of SiO2, SiO2 + TiO2 + ZrO2
Author :
Onanko, A.P. ; Kulish, M.P. ; Lyashenko, O.V. ; Prodayvoda, G.T. ; Vyzhva, S.A. ; Onanko, Y.A.
Author_Institution :
Taras Shevchenko Kyiv national university, Ukraine
Abstract :
A non-destructive method for the technological control of the structure defects in SiO2 + Si wafers by measuring the internal friction background difference on the nearby harmonics f1 and f2 after mechanical and heat treatments.
Keywords :
Crystals; Films; Friction; Microstructure; Silicon; Temperature measurement; Vibrations; dislocations; elastic module; internal friction; microstructure; structure defects;
Conference_Titel :
Oxide Materials for Electronic Engineering (OMEE), 2012 IEEE International Conference on
Conference_Location :
Lviv, Ukraine
Print_ISBN :
978-1-4673-4491-3
DOI :
10.1109/OMEE.2012.6464790
