• DocumentCode
    597492
  • Title

    A multi-stage discrete event simulation approach for scheduling of maintenance activities in a semiconductor manufacturing line

  • Author

    Scholl, Wolfgang ; Mosinski, Marcin ; Gan, B.P. ; Lendermann, Peter ; Preuss, Patrick ; Noack, D.

  • Author_Institution
    Infineon Technol. Dresden, Dresden, Germany
  • fYear
    2012
  • fDate
    9-12 Dec. 2012
  • Firstpage
    1
  • Lastpage
    10
  • Abstract
    Discrete event simulation (DES) has been established as a frequently used decision-support method in semiconductor manufacturing. One of the key application areas is the planning and scheduling of extended (several days) maintenance activities. The first stage of maintenance activity planning is conducted with a transient long-term simulation model with the focus on evaluating the effect of maintenance activity on the expected fab performance. Decisions such as wafer start reduction or adjustment of delivery commitments among affected work centers are made. The second stage of the planning is initiated several days before the start of the maintenance activities, where resource planning and scheduling of the activity is done through assessment of the expected WIP situation forecasted by a high fidelity online simulation model. In this paper, we will explain this simulation-based multi-stage approach for maintenance activity scheduling. The associated benefits and challenges will be presented with an example use case.
  • Keywords
    decision support systems; discrete event simulation; electronic engineering computing; maintenance engineering; planning; scheduling; semiconductor device manufacture; work in progress; DES; WIP situation; affected work centers; associated benefits; decision-support method; delivery commitments; expected fab performance; extended maintenance activity; maintenance activity planning; maintenance activity scheduling; multistage discrete event simulation approach; online simulation model; resource planning; resource scheduling; semiconductor manufacturing line; simulation-based multistage approach; transient long-term simulation model; wafer start adjustment; wafer start reduction; Availability; Computational modeling; Data models; Maintenance engineering; Planning; Predictive models; Semiconductor device modeling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Simulation Conference (WSC), Proceedings of the 2012 Winter
  • Conference_Location
    Berlin
  • ISSN
    0891-7736
  • Print_ISBN
    978-1-4673-4779-2
  • Electronic_ISBN
    0891-7736
  • Type

    conf

  • DOI
    10.1109/WSC.2012.6465320
  • Filename
    6465320