Title :
Oxide thin film transistors with ink-jet printed In-Ga-Zn oxide channel layer and ITO/IZO source/drain contacts
Author :
Wang, Yannan ; Sun, X.W. ; Liu, S.W. ; Kyaw, A.K.K. ; Zhao, J.L.
Author_Institution :
Sch. of EEE, Nanyang Technol. Univ., Singapore, Singapore
Abstract :
In-Ga-Zn oxide (IGZO) TFTs was fabricated by ink-jet printing technology on a silicon substrate with SiO2 on top. The device fabrication process includes printing ITO electrodes and IGZO semiconductor layer. A typical printed TFT shows a mobility of 0.32 cm2/V s and a contact resistance of ~1 MΩ. Device performance was further improved by inserting an IZO layer between the source/drain electrode and IGZO channel, which results in a contact resistance of 0.05 MΩ, and an enhanced mobility of 0.82 cm2/V s.
Keywords :
electrical contacts; indium compounds; ink jet printing; thin film transistors; IGZO TFT; ITO/IZO source/drain contacts; In-Ga-Zn; ink-jet printing technology; oxide channel layer; oxide thin film transistors; Contact resistance; Electrodes; Films; Gallium; Indium tin oxide; Printing; Thin film transistors; In-Ga-Zn oxide; contact resistance; ink-jet printing;
Conference_Titel :
Nanoelectronics Conference (INEC), 2013 IEEE 5th International
Conference_Location :
Singapore
Print_ISBN :
978-1-4673-4840-9
Electronic_ISBN :
2159-3523
DOI :
10.1109/INEC.2013.6465986