• DocumentCode
    597593
  • Title

    Conduction mechanism of single-electron transistors fabricated by field-emission-induced electromigration

  • Author

    Akimoto, S. ; Suda, Ryutaro ; Ito, Minora ; Ando, Makoto ; Shirakashi, J.

  • Author_Institution
    Dept. of Electr. & Electron. Eng., Tokyo Univ. of Agric. & Technol., Koganei, Japan
  • fYear
    2013
  • fDate
    2-4 Jan. 2013
  • Firstpage
    211
  • Lastpage
    214
  • Abstract
    We report the conduction mechanism of the single-electron transistors (SETs) fabricated by field-emission-induced electromigration, which is so-called “activation”. By applying the activation to Ni nanogaps, we were easily able to fabricate the SETs operating at room temperature. Additionally, strong Coulomb staircases were clearly obtained, and the quasi-periodic current oscillations were also observed at room temperature. These results indicate that the higher charging energy associated with a smaller Ni island structure within the multiple islands causes a bottleneck mechanism in conduction, improving the Coulomb staircase structures.
  • Keywords
    Coulomb blockade; electromigration; single electron transistors; Coulomb staircase structure; Ni; SET; conduction mechanism; field emission induced electromigration; quasiperiodic current oscillations; single electron transistors; temperature 293 K to 298 K; Electrodes; Nickel; Oscillators; Single electron transistors; Temperature; Temperature measurement; Voltage measurement; Coulomb blockade and single-electron transistor; electromigration; field emission current; nanogap;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanoelectronics Conference (INEC), 2013 IEEE 5th International
  • Conference_Location
    Singapore
  • ISSN
    2159-3523
  • Print_ISBN
    978-1-4673-4840-9
  • Electronic_ISBN
    2159-3523
  • Type

    conf

  • DOI
    10.1109/INEC.2013.6466001
  • Filename
    6466001