DocumentCode
597593
Title
Conduction mechanism of single-electron transistors fabricated by field-emission-induced electromigration
Author
Akimoto, S. ; Suda, Ryutaro ; Ito, Minora ; Ando, Makoto ; Shirakashi, J.
Author_Institution
Dept. of Electr. & Electron. Eng., Tokyo Univ. of Agric. & Technol., Koganei, Japan
fYear
2013
fDate
2-4 Jan. 2013
Firstpage
211
Lastpage
214
Abstract
We report the conduction mechanism of the single-electron transistors (SETs) fabricated by field-emission-induced electromigration, which is so-called “activation”. By applying the activation to Ni nanogaps, we were easily able to fabricate the SETs operating at room temperature. Additionally, strong Coulomb staircases were clearly obtained, and the quasi-periodic current oscillations were also observed at room temperature. These results indicate that the higher charging energy associated with a smaller Ni island structure within the multiple islands causes a bottleneck mechanism in conduction, improving the Coulomb staircase structures.
Keywords
Coulomb blockade; electromigration; single electron transistors; Coulomb staircase structure; Ni; SET; conduction mechanism; field emission induced electromigration; quasiperiodic current oscillations; single electron transistors; temperature 293 K to 298 K; Electrodes; Nickel; Oscillators; Single electron transistors; Temperature; Temperature measurement; Voltage measurement; Coulomb blockade and single-electron transistor; electromigration; field emission current; nanogap;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanoelectronics Conference (INEC), 2013 IEEE 5th International
Conference_Location
Singapore
ISSN
2159-3523
Print_ISBN
978-1-4673-4840-9
Electronic_ISBN
2159-3523
Type
conf
DOI
10.1109/INEC.2013.6466001
Filename
6466001
Link To Document