• DocumentCode
    598299
  • Title

    Investigations of fin vertical nonuniformity effects on junctionless multigate transistor

  • Author

    Haijun Lou ; Binghua Li ; Xinnan Lin ; Jin He ; Mansun Chan

  • Author_Institution
    Shenzhen Grad. Sch., Key Lab. of Integrated Microsyst., Peking Univ., Shenzhen, China
  • fYear
    2012
  • fDate
    Oct. 29 2012-Nov. 1 2012
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    The characteristics of junctionless multigate transistor (JMT) with fin vertical nonuniformity are investigated using three-dimensional simulation for the first time. The results show that the electrical characteristics, such as on-state current (Ion), subthreshold swing (SS) and drain induced barrier lowering (DIBL) effect, are affected by the sidewall angle (θ). The more superior SS and DIBL features also with smaller fluctuations have been observed in JMTs as compared with inversion-mode multigate MOSFETs (IM-MuGFETs). Hence, JMT is beneficial to suppress the short channel effects in the scaled devices.
  • Keywords
    MOSFET; fluctuations; drain induced barrier lowering effect; electrical characteristics; fin vertical nonuniformity effects; fluctuations; junctionless multigate transistor; on-state current; short channel effects; sidewall angle; subthreshold swing; three-dimensional simulation; Doping; Educational institutions; Logic gates; Semiconductor process modeling; Threshold voltage; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated Circuit Technology (ICSICT), 2012 IEEE 11th International Conference on
  • Conference_Location
    Xi´an
  • Print_ISBN
    978-1-4673-2474-8
  • Type

    conf

  • DOI
    10.1109/ICSICT.2012.6467617
  • Filename
    6467617