Title :
Investigations of fin vertical nonuniformity effects on junctionless multigate transistor
Author :
Haijun Lou ; Binghua Li ; Xinnan Lin ; Jin He ; Mansun Chan
Author_Institution :
Shenzhen Grad. Sch., Key Lab. of Integrated Microsyst., Peking Univ., Shenzhen, China
fDate :
Oct. 29 2012-Nov. 1 2012
Abstract :
The characteristics of junctionless multigate transistor (JMT) with fin vertical nonuniformity are investigated using three-dimensional simulation for the first time. The results show that the electrical characteristics, such as on-state current (Ion), subthreshold swing (SS) and drain induced barrier lowering (DIBL) effect, are affected by the sidewall angle (θ). The more superior SS and DIBL features also with smaller fluctuations have been observed in JMTs as compared with inversion-mode multigate MOSFETs (IM-MuGFETs). Hence, JMT is beneficial to suppress the short channel effects in the scaled devices.
Keywords :
MOSFET; fluctuations; drain induced barrier lowering effect; electrical characteristics; fin vertical nonuniformity effects; fluctuations; junctionless multigate transistor; on-state current; short channel effects; sidewall angle; subthreshold swing; three-dimensional simulation; Doping; Educational institutions; Logic gates; Semiconductor process modeling; Threshold voltage; Transistors;
Conference_Titel :
Solid-State and Integrated Circuit Technology (ICSICT), 2012 IEEE 11th International Conference on
Conference_Location :
Xi´an
Print_ISBN :
978-1-4673-2474-8
DOI :
10.1109/ICSICT.2012.6467617