DocumentCode :
598736
Title :
Keynote Address: Device reliability physics: Past, present, and future
Author :
Stathis, James
Author_Institution :
IBM
fYear :
2012
fDate :
14-18 Oct. 2012
Abstract :
Summary form only given. The importance of CMOS reliability grows as the world becomes more interconnected and instrumented. At the same time, the understanding of CMOS reliability is continuously challenged and transformed by the rapid evolution of technology. The recent introduction of new materials and structures (high-k, metal-gates, and FinFETs) challenges our understanding and ability to rapidly qualify new technologies. This talk will offer a selective retrospective of reliability physics in old-fashioned SiO2-based MOSFETs with poly-Si gates, and explore the extent to which the old models remain valid in present-day and future technologies.
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Integrated Reliability Workshop Final Report (IRW), 2012 IEEE International
Conference_Location :
South Lake Tahoe, CA
ISSN :
1930-8841
Print_ISBN :
978-1-4673-2749-7
Type :
conf
DOI :
10.1109/IIRW.2012.6468899
Filename :
6468899
Link To Document :
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