DocumentCode :
59966
Title :
Radiation-Hardening Technique for Voltage Reference Circuit in a Standard 130 nm CMOS Technology
Author :
Piccin, Yohan ; Lapuyade, Herve ; Deval, Yann ; Morche, Colette ; Seyler, Jean-Yves ; Goutti, Frederic
Author_Institution :
IMS Lab., Talence, France
Volume :
61
Issue :
2
fYear :
2014
fDate :
Apr-14
Firstpage :
967
Lastpage :
974
Abstract :
A radiation-hardening technique for a CMOS voltage reference circuit is proposed. Its operation principle consists in combining linearly two different NMOS threshold voltages and a Proportional-To-Absolute-Temperature (PTAT) voltage, which allows the compensation of both temperature-induced and radiation-induced discrepancies. This circuit was implemented in a standard 130 nm CMOS technology and designed in two different layouts. Measurements show a good operation with a minimal supply voltage of 2.5 V, a PSRR of 80 dB at 3.3 V. The voltage output shift is around 0.5% under irradiation up to 40 krad(Si). The active area of the circuit is about 0.04 mm2.
Keywords :
CMOS integrated circuits; integrated circuit layout; radiation hardening; reference circuits; NMOS threshold voltages; proportional-to-absolute-temperature voltage; radiation-hardening technique; size 130 nm; standard 130 nm CMOS technology; voltage 3.3 kV; voltage output shift; voltage reference circuit; CMOS integrated circuits; CMOS technology; Layout; Logic gates; MOSFET; Threshold voltage; Dose; interface-trap charge; oxide-trap charge; radiation; threshold-voltage;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.2014.2312269
Filename :
6782277
Link To Document :
بازگشت