• DocumentCode
    599836
  • Title

    Quantification of the zinc dopant concentration in GaAs nanowires

  • Author

    Burgess, Thomas ; Du, Shengzhi ; Gault, B. ; Gao, Q. ; Tan, H.H. ; Zheng, Ran ; Jagadish, C.

  • Author_Institution
    Dept. of Electron. Mater. Eng., Australian Nat. Univ., Canberra, ACT, Australia
  • fYear
    2012
  • fDate
    12-14 Dec. 2012
  • Firstpage
    41
  • Lastpage
    42
  • Abstract
    The zinc dopant concentration and distribution in GaAs nanowires is quantified by atom probe tomography. Material deposited radially by a vapour-solid process is shown to have a significantly higher dopant concentration in comparison to the core which grows by the vapour-liquid-solid process. Zinc concentrations of up to 7×1019 and 5×1020 atoms/cm3 are measured for core and shell materials respectively. Dopant activation is confirmed by electrical characterization which demonstrates an orders of magnitude increase in nanowire conductivity.
  • Keywords
    III-V semiconductors; MOCVD; doping profiles; electrical conductivity; gallium arsenide; nanowires; semiconductor doping; semiconductor growth; vapour phase epitaxial growth; GaAs:Zn; atom probe tomography; core materials; dopant activation; dopant concentration; electrical characterization; nanowire conductivity; nanowires distribution; radial material deposition; shell materials; vapour-solid process; Atomic layer deposition; Educational institutions; Gallium arsenide; Gold; Nanowires; Zinc;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optoelectronic and Microelectronic Materials & Devices (COMMAD), 2012 Conference on
  • Conference_Location
    Melbourne, VIC
  • ISSN
    1097-2137
  • Print_ISBN
    978-1-4673-3047-3
  • Type

    conf

  • DOI
    10.1109/COMMAD.2012.6472350
  • Filename
    6472350