DocumentCode
599836
Title
Quantification of the zinc dopant concentration in GaAs nanowires
Author
Burgess, Thomas ; Du, Shengzhi ; Gault, B. ; Gao, Q. ; Tan, H.H. ; Zheng, Ran ; Jagadish, C.
Author_Institution
Dept. of Electron. Mater. Eng., Australian Nat. Univ., Canberra, ACT, Australia
fYear
2012
fDate
12-14 Dec. 2012
Firstpage
41
Lastpage
42
Abstract
The zinc dopant concentration and distribution in GaAs nanowires is quantified by atom probe tomography. Material deposited radially by a vapour-solid process is shown to have a significantly higher dopant concentration in comparison to the core which grows by the vapour-liquid-solid process. Zinc concentrations of up to 7×1019 and 5×1020 atoms/cm3 are measured for core and shell materials respectively. Dopant activation is confirmed by electrical characterization which demonstrates an orders of magnitude increase in nanowire conductivity.
Keywords
III-V semiconductors; MOCVD; doping profiles; electrical conductivity; gallium arsenide; nanowires; semiconductor doping; semiconductor growth; vapour phase epitaxial growth; GaAs:Zn; atom probe tomography; core materials; dopant activation; dopant concentration; electrical characterization; nanowire conductivity; nanowires distribution; radial material deposition; shell materials; vapour-solid process; Atomic layer deposition; Educational institutions; Gallium arsenide; Gold; Nanowires; Zinc;
fLanguage
English
Publisher
ieee
Conference_Titel
Optoelectronic and Microelectronic Materials & Devices (COMMAD), 2012 Conference on
Conference_Location
Melbourne, VIC
ISSN
1097-2137
Print_ISBN
978-1-4673-3047-3
Type
conf
DOI
10.1109/COMMAD.2012.6472350
Filename
6472350
Link To Document