DocumentCode :
599842
Title :
Droplet epitaxy of strain-free GaAs/AlGaAs quantum molecules for optoelectronic applications
Author :
Lei, W. ; Parkinson, P. ; Tan, H.H. ; Jagadish, C.
Author_Institution :
Dept. of Electron. Mater. Eng., Australian Nat. Univ., Canberra, ACT, Australia
fYear :
2012
fDate :
12-14 Dec. 2012
Firstpage :
53
Lastpage :
54
Abstract :
This work presents a pioneering study on the MOCVD droplet epitaxy of strain-free GaAs/Al0.3Ga0.7As quantum molecules. By choosing the appropriate growth conditions, GaAs quantum molecules can be obtained with controlled size and density. The formation of these molecules is mainly due to the anisotropic migration of Ga adatoms and the edge enhanced crystallization process. Furthermore, these molecules show excellent optical properties, suggesting their promising applications in devices such as infrared photodetectors and quantum information processing.
Keywords :
III-V semiconductors; MOCVD; aluminium compounds; drops; gallium arsenide; optoelectronic devices; semiconductor quantum dots; Ga adatoms; GaAs-Al0.3Ga0.7As; MOCVD droplet epitaxy; anisotropic migration; appropriate growth conditions; controlled density; controlled size; edge enhanced crystallization; optical properties; optoelectronic applications; strain-free GaAs/AlGaAs quantum molecules; Epitaxial growth; Gallium arsenide; MOCVD; Nanostructures; Optical devices; Optical imaging; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optoelectronic and Microelectronic Materials & Devices (COMMAD), 2012 Conference on
Conference_Location :
Melbourne, VIC
ISSN :
1097-2137
Print_ISBN :
978-1-4673-3047-3
Type :
conf
DOI :
10.1109/COMMAD.2012.6472356
Filename :
6472356
Link To Document :
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