DocumentCode :
599876
Title :
Low-band gap nanoparticles embedded in high-K dielectrics
Author :
Nestler, T. ; Haas, S. ; Otto, R. ; Schneider, Fabian ; Hickey, S.G. ; Gabriel, Solari ; Himcinschi, C. ; Klemm, Volker ; Schreiber, Gabriel ; Heitmann, J.
Author_Institution :
Inst. fur Angewandte Phys., Tech. Univ. Bergakad. Freiberg, Freiberg, Germany
fYear :
2012
fDate :
12-14 Dec. 2012
Firstpage :
123
Lastpage :
124
Abstract :
In this paper our recent research on Ge and PbS nanoparticles embedded in ZrO2 will be reviewed. Ge nanoparticles have been deposited by rf-cosputtering of ZrGe2O2.9/ZrO2 superlattices and subsequent annealing. ZrO2 and the phase separated Ge crystallizes at 650°C into nanocrystalline layers. These layers show a luminescence signal at 2.5 eV, which is contributed to defect luminescence. PbS nanoparticles have been fabricated using wet chemical methods and embedded in the ZrO2 matrix by sol-gel deposition. In this case a luminescence signal at 1.3 μm has been detected after annealing at 100°C.
Keywords :
IV-VI semiconductors; annealing; crystallisation; elemental semiconductors; germanium; high-k dielectric thin films; lead compounds; nanofabrication; nanoparticles; phase separation; photoluminescence; semiconductor growth; sol-gel processing; sputter deposition; superlattices; zirconium compounds; Ge-ZrO2; PbS-ZrO2; annealing; chemical methods; crystallization; defect luminescence; high-k dielectrics; low-band gap nanoparticles; luminescence signal; nanocrystalline layers; phase separation; radiofrequency cosputtering; sol-gel deposition; superlattices; temperature 100 degC; temperature 650 degC; Annealing; Films; High K dielectric materials; Luminescence; Nanocrystals;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optoelectronic and Microelectronic Materials & Devices (COMMAD), 2012 Conference on
Conference_Location :
Melbourne, VIC
ISSN :
1097-2137
Print_ISBN :
978-1-4673-3047-3
Type :
conf
DOI :
10.1109/COMMAD.2012.6472391
Filename :
6472391
Link To Document :
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