Title :
Fluorination of single-walled carbon nanotubes via CHF3 plasma
Author :
Lee, Kin Keung ; Li, Yuhua
Author_Institution :
Centre for Quantum Comput. & Commun. Technol., Univ. of Melbourne, Melbourne, VIC, Australia
Abstract :
In this study, we modified single-walled carbon nanotubes (SWCNTs) by CHF3 plasma generated by reactive-ion etching (RIE) reactor. X-ray photo-electron spectroscopy (XPS) indicated fluorine atoms were attached to the side wall of CNTs. Static contact angle (CA) measurements indicated a very significant increase in the water contact angle from 65° for pristine CNTs to 170° for the doped SWCNTs.
Keywords :
X-ray photoelectron spectra; carbon nanotubes; contact angle; fluorine; plasma materials processing; sputter etching; C:F; CHF3 plasma; X-ray photoelectron spectroscopy; XPS; fluorination; fluorine atoms; reactive-ion etching reactor; single-walled carbon nanotubes; static contact angle; water contact angle; Carbon; Carbon nanotubes; Educational institutions; Plasma measurements; Plasmas; Spectroscopy; Surface treatment;
Conference_Titel :
Optoelectronic and Microelectronic Materials & Devices (COMMAD), 2012 Conference on
Conference_Location :
Melbourne, VIC
Print_ISBN :
978-1-4673-3047-3
DOI :
10.1109/COMMAD.2012.6472417
