DocumentCode
599902
Title
Characterisation of solid-phase-epitaxy of amorphous germanium thin-films
Author
Leong, M. ; McCallum, J.C. ; Lee, Kin Keung ; Impellizzeri, G. ; Romano, Lucia
Author_Institution
Sch. of Phys., Univ. of Melbourne, Melbourne, VIC, Australia
fYear
2012
fDate
12-14 Dec. 2012
Firstpage
177
Lastpage
178
Abstract
The development of processes involving amorphous germanium for electronic and photonic applications is investigated.
Keywords
Schottky diodes; amorphous semiconductors; elemental semiconductors; germanium; semiconductor epitaxial layers; semiconductor growth; solid phase epitaxial growth; Ge; amorphous germanium thin-films; electronic applications; photonic applications; solid-phase-epitaxy; Annealing; Australia; Educational institutions; Germanium; Ion implantation; Photonics; Physics;
fLanguage
English
Publisher
ieee
Conference_Titel
Optoelectronic and Microelectronic Materials & Devices (COMMAD), 2012 Conference on
Conference_Location
Melbourne, VIC
ISSN
1097-2137
Print_ISBN
978-1-4673-3047-3
Type
conf
DOI
10.1109/COMMAD.2012.6472418
Filename
6472418
Link To Document