DocumentCode :
599902
Title :
Characterisation of solid-phase-epitaxy of amorphous germanium thin-films
Author :
Leong, M. ; McCallum, J.C. ; Lee, Kin Keung ; Impellizzeri, G. ; Romano, Lucia
Author_Institution :
Sch. of Phys., Univ. of Melbourne, Melbourne, VIC, Australia
fYear :
2012
fDate :
12-14 Dec. 2012
Firstpage :
177
Lastpage :
178
Abstract :
The development of processes involving amorphous germanium for electronic and photonic applications is investigated.
Keywords :
Schottky diodes; amorphous semiconductors; elemental semiconductors; germanium; semiconductor epitaxial layers; semiconductor growth; solid phase epitaxial growth; Ge; amorphous germanium thin-films; electronic applications; photonic applications; solid-phase-epitaxy; Annealing; Australia; Educational institutions; Germanium; Ion implantation; Photonics; Physics;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optoelectronic and Microelectronic Materials & Devices (COMMAD), 2012 Conference on
Conference_Location :
Melbourne, VIC
ISSN :
1097-2137
Print_ISBN :
978-1-4673-3047-3
Type :
conf
DOI :
10.1109/COMMAD.2012.6472418
Filename :
6472418
Link To Document :
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