Title :
Corner and short-channel effects in recessed channel dopant segregated Schottky barrier MOSFETs
Author :
Hsia, J.K. ; Shih, C.H.
Author_Institution :
Dept. of Electr. Eng., Nat. Chi Nan Univ., Nantou, Taiwan
Abstract :
This work numerically examines the corner and short-channel effects in dopant segregated Schottky barrier MOSFETs (DS-SBMOS) with recessed channel. The recessed channel suppresses effectively the short-channel effect in the DS-SBMOS devices, whereas the recessed channel and oxide corners leads to a lower on-state current and worse on-off switching. The recessed depth plays the key role to optimize the on-current and subthreshold swing in the recessed channel DS-SBMOS.
Keywords :
MOSFET; Schottky barriers; semiconductor doping; DS-SBMOS; Schottky barrier MOSFET; channel dopant; corner-channel effects; short-channel effects; Educational institutions; Electrical engineering; Logic gates; MOSFETs; Metals; Schottky barriers; Switches;
Conference_Titel :
Optoelectronic and Microelectronic Materials & Devices (COMMAD), 2012 Conference on
Conference_Location :
Melbourne, VIC
Print_ISBN :
978-1-4673-3047-3
DOI :
10.1109/COMMAD.2012.6472433