Optimization of thin film deposition using multi-parametric surface plasmon resonance: A new technique to determine thickness and refractive index of thin and thick layers

Author

Kuncova-Kallio, J. ; Tuppurainen, Jussi-Pekka ; Sadowski, Janusz W. ; Granqvist, Niko

Author_Institution

BioNavis Ltd., Tampere, Finland

fYear

2012

fDate

Aug. 29 2012-Sept. 1 2012

Firstpage

347

Lastpage

350

Abstract

We present a new method for measuring thicknesses and refractive indices of ultrathin, thin and relatively thick films by using multi-parametric surface plasmon resonance (MP-SPR). The layers measured can be multiple layers of organic, inorganic, metallic, and it is also possible to follow interaction kinetics of interaction components with all these materials. In this paper, MP-SPR is applied as a method for optimization of thin film deposition, here vacuum evaporation.

Keywords

refractive index; surface plasmon resonance; thin films; vacuum deposition; MP-SPR; inorganic layers; interaction components; interaction kinetics; metallic layers; multiparametric surface plasmon resonance; organic layers; refractive index; thick film thickness; thin film deposition; ultrathin film thickness; vacuum evaporation; Materials; Optical surface waves; Plasmons; Refractive index; Thickness measurement; Wavelength measurement; SPR; characterization; multi-parametric surface plasmon resonance; process optimization; refractive index; thickness; thin film deposition; ultrathin film;

fLanguage

English

Publisher

ieee

Conference_Titel

Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO), 2012 International Conference on

Conference_Location

Shaanxi

Print_ISBN

978-1-4673-4588-0

Electronic_ISBN

978-1-4673-4589-7

Type

conf

DOI

10.1109/3M-NANO.2012.6472952

Filename

6472952