Periodic sub-wavelength surface-relief structures for antireflection

Author

Gu, Xingfa ; Liu, Wenxin ; Zhang, Wensheng ; Zhang, Fang ; Yuan, Lei ; Wang, Y.Y. ; Peng, C.S.

Author_Institution

Inst. of Inf. Opt. Eng., Soochow Univ., Suzhou, China

fYear

2012

fDate

Aug. 29 2012-Sept. 1 2012

Firstpage

351

Lastpage

354

Abstract

Periodic sub-wavelength nanocones were simulated for antireflection with three different heights: 300, 500 and 700 nm on Si substrate. On the top of nanocones, we add a layer of Ni and SiO₂ with the thicknesses of 10 nm, 20 nm and 30 nm. The reflective characteristics of nanostructures with or without nanomasks were studied by rigorous coupled-wave analysis (RCWA).

Keywords

antireflection coatings; masks; nanostructured materials; nickel; silicon; silicon compounds; Ni; RCWA; Si; SiO₂; antireflection surfaces; nanomasks; nanostructures; periodic subwavelength nanocones; periodic subwavelength surface relief structures; rigorous coupled wave analysis; size 10 nm; size 20 nm; size 30 nm; size 300 nm; size 500 nm; size 700 nm; Nanostructures; Nickel; Optical surface waves; Periodic structures; Reflectivity; Silicon; Substrates; RCWA; etching masks; reflective characteristics; sub-wavelength nanocones;

fLanguage

English

Publisher

ieee

Conference_Titel

Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO), 2012 International Conference on

Conference_Location

Shaanxi

Print_ISBN

978-1-4673-4588-0

Electronic_ISBN

978-1-4673-4589-7

Type

conf

DOI

10.1109/3M-NANO.2012.6472953

Filename

6472953