DocumentCode
600319
Title
Demonstration of a self aligned hybrid silicon-plasmonic waveguide with low loss and nanoscale confinement
Author
Desiatov, Boris ; Goykhman, Ilya ; Levy, Uriel
Author_Institution
Dept. of Appl. Phys., Hebrew Univ. of Jerusalem, Jerusalem, Israel
fYear
2012
fDate
4-8 March 2012
Firstpage
1
Lastpage
3
Abstract
We demonstrate self-aligned approach for fabricating hybrid silicon plasmonic waveguide. The demonstrated structure provides nanoscale confinement together with propagation length of 100 microns on chip. Near-field measurements of propagation and coupling loss are presented.
Keywords
elemental semiconductors; light propagation; optical fabrication; optical losses; optical waveguides; plasmonics; silicon; Si; coupling loss; nanoscale confinement; near-field measurement; propagation length; propagation loss; self aligned hybrid silicon-plasmonic waveguide; size 100 micron; Optical device fabrication; Optical variables measurement; Optical waveguides; Photonics; Plasmons;
fLanguage
English
Publisher
ieee
Conference_Titel
Optical Fiber Communication Conference and Exposition (OFC/NFOEC), 2012 and the National Fiber Optic Engineers Conference
Conference_Location
Los Angeles, CA
ISSN
pending
Print_ISBN
978-1-4673-0262-3
Type
conf
Filename
6476141
Link To Document