DocumentCode :
600319
Title :
Demonstration of a self aligned hybrid silicon-plasmonic waveguide with low loss and nanoscale confinement
Author :
Desiatov, Boris ; Goykhman, Ilya ; Levy, Uriel
Author_Institution :
Dept. of Appl. Phys., Hebrew Univ. of Jerusalem, Jerusalem, Israel
fYear :
2012
fDate :
4-8 March 2012
Firstpage :
1
Lastpage :
3
Abstract :
We demonstrate self-aligned approach for fabricating hybrid silicon plasmonic waveguide. The demonstrated structure provides nanoscale confinement together with propagation length of 100 microns on chip. Near-field measurements of propagation and coupling loss are presented.
Keywords :
elemental semiconductors; light propagation; optical fabrication; optical losses; optical waveguides; plasmonics; silicon; Si; coupling loss; nanoscale confinement; near-field measurement; propagation length; propagation loss; self aligned hybrid silicon-plasmonic waveguide; size 100 micron; Optical device fabrication; Optical variables measurement; Optical waveguides; Photonics; Plasmons;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optical Fiber Communication Conference and Exposition (OFC/NFOEC), 2012 and the National Fiber Optic Engineers Conference
Conference_Location :
Los Angeles, CA
ISSN :
pending
Print_ISBN :
978-1-4673-0262-3
Type :
conf
Filename :
6476141
Link To Document :
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