• DocumentCode
    600319
  • Title

    Demonstration of a self aligned hybrid silicon-plasmonic waveguide with low loss and nanoscale confinement

  • Author

    Desiatov, Boris ; Goykhman, Ilya ; Levy, Uriel

  • Author_Institution
    Dept. of Appl. Phys., Hebrew Univ. of Jerusalem, Jerusalem, Israel
  • fYear
    2012
  • fDate
    4-8 March 2012
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    We demonstrate self-aligned approach for fabricating hybrid silicon plasmonic waveguide. The demonstrated structure provides nanoscale confinement together with propagation length of 100 microns on chip. Near-field measurements of propagation and coupling loss are presented.
  • Keywords
    elemental semiconductors; light propagation; optical fabrication; optical losses; optical waveguides; plasmonics; silicon; Si; coupling loss; nanoscale confinement; near-field measurement; propagation length; propagation loss; self aligned hybrid silicon-plasmonic waveguide; size 100 micron; Optical device fabrication; Optical variables measurement; Optical waveguides; Photonics; Plasmons;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optical Fiber Communication Conference and Exposition (OFC/NFOEC), 2012 and the National Fiber Optic Engineers Conference
  • Conference_Location
    Los Angeles, CA
  • ISSN
    pending
  • Print_ISBN
    978-1-4673-0262-3
  • Type

    conf

  • Filename
    6476141