DocumentCode :
602365
Title :
The impact of stencil aperture design for next generation ultra-fine pitch printing
Author :
Whitmore, M. ; Schake, J. ; Ashmore, C.
Author_Institution :
DEK Printing Machines Ltd., Weymouth, UK
fYear :
2012
fDate :
6-8 Nov. 2012
Firstpage :
1
Lastpage :
7
Abstract :
Miniaturisation is pushing the stencil printing process. As features become smaller, solder paste transfer efficiency is becoming more critical. In latest research work, actual paste deposit volumes and transfer efficiency have been monitored and compared for both square and round apertures with area ratio´s ranging from 0.20 thru to 1.35. This covers apertures sizes of between 100 and 550 microns in a nominal 100 micron thick stencil foil. In addition, the effect of ultrasonically activated squeegees (ProActiv) has been assessed as part of the same experiment. A further comparison has also been made between type 4 and type 4.5 solder paste aswell. The data presented here will help provide guidelines for stencil aperture designs and strategies for ultra-fille pitch components such as 0.3CSP´s.
Keywords :
fine-pitch technology; solders; ProActiv effect; next generation ultra-fine pitch printing; paste deposit volumes; size 100 micron to 550 micron; solder paste transfer efficiency; stencil aperture design; stencil foil; stencil printing process; ultra-fille pitch components; ultrasonically activated squeegees effect; 0.3mm pitch CSP´s; Paste transfer efficiency; aperture design; area ratio; paste volume; stencil printing; ultra fine pitch components;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Manufacturing Technology Symposium (IEMT), 2012 35th IEEE/CPMT International
Conference_Location :
Ipoh
ISSN :
1089-8190
Print_ISBN :
978-1-4673-4384-8
Electronic_ISBN :
1089-8190
Type :
conf
DOI :
10.1109/IEMT.2012.6521805
Filename :
6521805
Link To Document :
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