Title :
Low cycle fatigue crack initiation and propagation behavior of copper thin films used in electronic devices
Author :
Kambayashi, Takashi ; Sakane, M. ; Hirohata, K.
Author_Institution :
Dept. of Mech. Enginnering, Ritsumeikan Univ., Kusatsu, Japan
Abstract :
This paper presents the crack initiation and propagation behavior in 4-point bending low cycle fatigue for four kinds of copper thin films used in electronic devices at room and 353K. There was a distinct difference in cycles to crack depending on the fabrication process but not on surface roughness. The crack propagation rates depended on the fabrication process of the films but surface roughness. Raising the testing temperature accelealeted cycle to crack and cracks propagation rate.
Keywords :
bending; copper; fatigue cracks; fracture mechanics; mechanical testing; metallic thin films; Cu; bending; copper thin films; crack testing; fatigue crack initiation; fatigue crack propagation; surface roughness; temperature 293 K to 298 K; temperature 353 K;
Conference_Titel :
CPMT Symposium Japan, 2012 2nd IEEE
Conference_Location :
Kyoto
Print_ISBN :
978-1-4673-2654-4
DOI :
10.1109/ICSJ.2012.6523425