DocumentCode :
602831
Title :
Ab initio validation of continuum models for Si/SiO2 interfaces
Author :
Biel, B. ; Donetti, L. ; Godoy, Andres ; Gamiz, F.J.
Author_Institution :
Dipt. Electron. y Tecnol. de Comput., Campus de Fuente Nueva Univ. de Granada, Granada, Spain
fYear :
2013
fDate :
19-21 March 2013
Firstpage :
165
Lastpage :
168
Abstract :
A Density Functional Theory study on the scaling properties of SOI nanostructures is provided in this work. Starting from an atomistic, purely quantum-mechanical treatment of the nanostructures, we analyze the bandstructures and bandgap values to extract the main trends in their behaviours as the size of the nanodevices goes down. We compare the ab initio bandstructures with the ones obtained by means of k·p calculations, to determine the actual range of device dimensions for which the use of atomistic tools is mandatory, and whether traditional device simulation in such a range can be improved by using atomistic methods for each device type.
Keywords :
ab initio calculations; band structure; density functional theory; k.p calculations; nanostructured materials; quantum theory; silicon; silicon compounds; silicon-on-insulator; SOI nanostructures; Si-SiO2; ab initio validation; atomistic methods; band structures; bandgap values; continuum models; density functional theory; k·p calculations; nanodevices; quantum-mechanical treatment; scaling properties; Silicon; Tin; SOI; SiO2; ab initio; interfaces; k·p;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ultimate Integration on Silicon (ULIS), 2013 14th International Conference on
Conference_Location :
Coventry
Print_ISBN :
978-1-4673-4800-3
Electronic_ISBN :
978-1-4673-4801-0
Type :
conf
DOI :
10.1109/ULIS.2013.6523509
Filename :
6523509
Link To Document :
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