• DocumentCode
    602934
  • Title

    A predictable compact model for non-monotonous Vth-Pelgrom plot of long channel halo-implanted transistors

  • Author

    Kumashiro, S.

  • Author_Institution
    Renesas Electron. Corp., Kawasaki, Japan
  • fYear
    2013
  • fDate
    4-6 March 2013
  • Firstpage
    391
  • Lastpage
    397
  • Abstract
    It is well-known that Vth (threshold voltage) Pelgrom plot [1][2] of halo-implanted transistors show non-monotonous behavior in long channel region where analog circuits are usually designed [3]-[7]. However, none of the preceding works have presented physically based predictable model for this phenomenon. In this paper, a compact model which can predict the non-monotonous behavior of the Vth-Pelgrom plot of long channel halo-implanted transistors with respect to the change of their impurity profiles and/or device structures has been presented for the first time. The model is derived by combining the expressions of Hueting´s GCH model [8] and Pang´s analytical surface potential model [9] together with proper approximation. The model can accurately reproduce measurement results and also can predict how Vth variation behaves with respect to halo and channel profile change. It is also shown that there is a high sensitivity band of Vth variation in halo versus channel doping concentration space.
  • Keywords
    MOSFET; semiconductor device models; semiconductor doping; Hueting GCH model; Pang analytical surface potential model; analog circuits; channel doping concentration space; long channel halo-implanted transistors; long channel region; nonmonotonous threshold voltage Pelgrom plot; predictable compact model; Doping; Electric potential; MOS devices; Predictive models; Semiconductor process modeling; Taylor series; Transistors; Compact model; Halo implant; Pelgrom plot; Vth;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Quality Electronic Design (ISQED), 2013 14th International Symposium on
  • Conference_Location
    Santa Clara, CA
  • ISSN
    1948-3287
  • Print_ISBN
    978-1-4673-4951-2
  • Type

    conf

  • DOI
    10.1109/ISQED.2013.6523641
  • Filename
    6523641