• DocumentCode
    602939
  • Title

    Peak power reduction of a sensor network processor fabricated with Deeply Depleted Channel transistors in 65nm technology

  • Author

    Kawakami, Kenji ; Shiro, T. ; Yamasaki, Hirofumi ; Yoda, K. ; Fujimoto, Hiroshi ; Kawasaki, Keisuke ; Watanabe, Yoshihiro

  • Author_Institution
    Fujitsu Labs. Ltd., Kawasaki, Japan
  • fYear
    2013
  • fDate
    4-6 March 2013
  • Firstpage
    422
  • Lastpage
    429
  • Abstract
    We fabricated a low power sensor network processor with Deeply Depleted Channel (DDC) transistors of 65 nm technology, which has distinguishing device structure and enables variation of threshold voltage (Vth) of transistors to decrease. At the optimal voltage condition to achieve the same maximum operating frequency, measurement result shows that the DDC process achieves a 47.0 % of peak power reduction for the micro controller unit (MCU) compared to the conventional low power (LP) process. Measurement result also shows the DDC process improves 56.5 % and 15.0 % of operating frequency, 200 mV and 50 mV of supply voltage margin, or 23.8 % and 19.0 % of power reduction for the MCU and 320 KB SRAM, respectively, even if the Vth of the LP process is adjusted to that of the DDC process. The paper has also discussed the optimal voltage control method, which is suitable for the various applications of sensor network processors.
  • Keywords
    MOSFET; SRAM chips; low-power electronics; microcontrollers; DDC process; DDC transistor; LP process; MCU; SRAM; deeply depleted channel transistor; device structure; low power process; low power sensor network processor; microcontroller unit; optimal voltage condition; optimal voltage control; peak power reduction; size 65 nm; threshold voltage; voltage 200 mV; voltage 50 mV; Delays; Power demand; Process control; Random access memory; Threshold voltage; Transistors; Voltage measurement; Deeply Depleted Channel (DDC) transistor; sensor network processor; supply voltage margin; threshold voltage variation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Quality Electronic Design (ISQED), 2013 14th International Symposium on
  • Conference_Location
    Santa Clara, CA
  • ISSN
    1948-3287
  • Print_ISBN
    978-1-4673-4951-2
  • Type

    conf

  • DOI
    10.1109/ISQED.2013.6523646
  • Filename
    6523646