DocumentCode :
602939
Title :
Peak power reduction of a sensor network processor fabricated with Deeply Depleted Channel transistors in 65nm technology
Author :
Kawakami, Kenji ; Shiro, T. ; Yamasaki, Hirofumi ; Yoda, K. ; Fujimoto, Hiroshi ; Kawasaki, Keisuke ; Watanabe, Yoshihiro
Author_Institution :
Fujitsu Labs. Ltd., Kawasaki, Japan
fYear :
2013
fDate :
4-6 March 2013
Firstpage :
422
Lastpage :
429
Abstract :
We fabricated a low power sensor network processor with Deeply Depleted Channel (DDC) transistors of 65 nm technology, which has distinguishing device structure and enables variation of threshold voltage (Vth) of transistors to decrease. At the optimal voltage condition to achieve the same maximum operating frequency, measurement result shows that the DDC process achieves a 47.0 % of peak power reduction for the micro controller unit (MCU) compared to the conventional low power (LP) process. Measurement result also shows the DDC process improves 56.5 % and 15.0 % of operating frequency, 200 mV and 50 mV of supply voltage margin, or 23.8 % and 19.0 % of power reduction for the MCU and 320 KB SRAM, respectively, even if the Vth of the LP process is adjusted to that of the DDC process. The paper has also discussed the optimal voltage control method, which is suitable for the various applications of sensor network processors.
Keywords :
MOSFET; SRAM chips; low-power electronics; microcontrollers; DDC process; DDC transistor; LP process; MCU; SRAM; deeply depleted channel transistor; device structure; low power process; low power sensor network processor; microcontroller unit; optimal voltage condition; optimal voltage control; peak power reduction; size 65 nm; threshold voltage; voltage 200 mV; voltage 50 mV; Delays; Power demand; Process control; Random access memory; Threshold voltage; Transistors; Voltage measurement; Deeply Depleted Channel (DDC) transistor; sensor network processor; supply voltage margin; threshold voltage variation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Quality Electronic Design (ISQED), 2013 14th International Symposium on
Conference_Location :
Santa Clara, CA
ISSN :
1948-3287
Print_ISBN :
978-1-4673-4951-2
Type :
conf
DOI :
10.1109/ISQED.2013.6523646
Filename :
6523646
Link To Document :
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