• DocumentCode
    6036
  • Title

    Separation of the Geometric Current in Charge Pumping Measurement of Polycrystalline Si Thin-Film Transistors

  • Author

    Jiajia Wang ; Mingxiang Wang

  • Author_Institution
    Dept. of Microelectron., Soochow Univ., Suzhou, China
  • Volume
    61
  • Issue
    12
  • fYear
    2014
  • fDate
    Dec. 2014
  • Firstpage
    4113
  • Lastpage
    4119
  • Abstract
    In the charge pumping (CP) measurement of polycrystalline Si (poly-Si) thin-film transistors (TFTs), an experimental approach is developed to evaluate and separate the geometric current (Igeo) from the measured CP current based on a group of TFTs with different channel widths and fixed channel length. Along with the separation of Igeo, a new method is proposed to reliably characterize the trap state density of TFTs. Without the Igeo, the overestimation in CP measurement is avoided even for short CP pulse transition times. Moreover, critical transition time for the occurrence of geometry effect is determined, which agrees well with the prediction from a physical model of diffusion controlled carrier evacuation.
  • Keywords
    charge pump circuits; elemental semiconductors; semiconductor device models; semiconductor device reliability; separation; silicon; thin film transistors; charge pumping measurement; critical transition time; diffusion controlled carrier evacuation; geometric current; polycrystalline thin film transistors; Charge carrier processes; Current measurement; Logic gates; MOSFET; Pulse measurements; Silicon; Thin film transistors; Charge pumping (CP); geometric current $(I_{rm geo})$; geometric current (Igeo); polycrystalline Si (poly-Si); thin-film transistors (TFTs); trap state density $(D_{t})$; trap state density (Dt).;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2014.2361777
  • Filename
    6932424